p-Hydroxystyrene

Main Applications

Functional Polymer Material Monomers:

Poly(p-hydroxystyrene) (PHS) is a key raw material for photoresists, especially in semiconductor manufacturing. After chemical modification, PHS can serve as the base material for ultraviolet photoresists, featuring high resolution and etch resistance.

Used for preparing ion exchange resins and adsorption resins (utilizing the polar adsorption of polar molecules by phenolic hydroxyl groups).

Organic Synthesis Intermediates:

Used for synthesizing pharmaceutical and agrochemical intermediates (such as antibacterial agents and anti-inflammatory drug precursors).

Functional monomers are generated via esterification or alkylation reactions, used for preparing coatings and adhesives (enhancing adhesion to polar substrates).

Other Applications:

Used as a crosslinking agent for polymer modification; by reacting phenolic hydroxyl groups with isocyanates, epoxy resins, etc., it improves the mechanical properties and chemical resistance of materials.

Used for preparing fluorescent probes and sensors (utilizing the recognition of metal ions by phenolic hydroxyl groups).